Bengt Nilsson received the B.S. degree from Polhemsgymnasiet, Gothenburg, Sweden, in 1974, and the M.S. degree from Chalmers University of Technology, Gothenburg, Sweden, in 1984. He started the assembly of the technological base and competence for the nanofabrication activity in the Low Temperature Physics group under Tord Claeson at the Chalmers Physics Department in 1985. He worked as the Laboratory Manager for the Swedish Nanofabrication Laboratory, from 1987 to 1999, until it was merged with the other microtechnology-oriented laboratories at Chalmers into the MC2/Nanofabrication Laboratory (NFL) cleanroom facility in 1999. At the Chalmers NFL, he is now responsible for the electron-beam (e-beam) lithography processing equipment and most of the external e-beam related projects. He has more than 25 years of experience and expertise in e-beam lithography processing and process optimization in deep submicrometer range, as well as in interaction with laboratory users and project planning. He has experience in pattern data and job file preprocessing for e-beam exposure and in proximity effect compensation based on experimental and theoretical proximity function evaluation. He also has a broad experience in submicrometer pattern transfer by wet and dry plasma/ion etching, as well as state-of-the-art sub-20-nm negative and positive patterning by e-beam lithography.