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Research Interests

Papers共 61 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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主题
期刊级别
合作者
合作机构
Front-side Integration of Middle-of-line Stacked Contacts for Monolithic CFET
V. Vega-Gonzalez, K. Stiers, C. Sheng,S. Demuynck,C Toledo de Carvalho Cavalcante, L. Petersen,T. Chiarella,J. Boemmels, T. Sarkar, N. Franchina Vergel,D. Radisic,R. Loo,E. Rosseel,C. Porret,G. Mannaert,S. Choudhury,V. Brissonneau,E. Dupuy,A. Peter,N. Jourdan,J-P. Soulié,T. Hakamata, A. Romo-Negreira,R. Clark,K. Vandersmissen,F. Sebaai,P. Puttarame Gowda, J.G. Lai, A. Mingardi, S. Kumar Sarkar,B. T. Chan, A. Sepulveda Marquez,R. Langer, I. Gyo Koo,E. Altamirano Sanchez,K. Devriendt, P. Rincon Delgadillo,F. Lazzarino,J. Mitard,J. Geypen,D. Batuk, Y-F. Chen, F. Verbeeck,F. Holsteyns,S. Subramanian,Zs. Tőkei,N. Horiguchi,S. Biesemans
2024 IEEE International Interconnect Technology Conference (IITC)pp.1-3, (2024)
Cited1Views0EIWOSBibtex
1
0
Molybdenum Nitride As a Scalable and Thermally Stable Pwfm for CFET
Hiroaki Arimura,S. Brus,Jacopo Franco,Y. Oniki,A. Vandooren,T. Conard,B. T. Chan, B. Kannan, M. Samiee, W. Li, P. Deminskyi,E. Shero, J. Bakke,N. Jourdan,G. Alessio Verni,J. W. Maes,M. Givens,Lars-Åke Ragnarsson,Jérôme Mitard,E. Dentoni Litta,N. Horiguchi
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (2023)
Cited1Views0EIWOSBibtex
1
0
Middle-of-line Plasma Dry Etch Challenges for CFET Integration
Dunja Radisic, Maryam Hosseini,Hans Mertens, Daisy Zhou,Victor Vega Gonzalez, Shouhua Wang,B.T. Chan,Dmitry Batuk,Emmanuel Dupuy, Zheng Tao,Eugenio Dentoni Litta,Naoto Horiguchi
Advanced Etch Technology and Process Integration for Nanopatterning XII (2023)
Cited1Views0Bibtex
1
0
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Author Statistics

#Papers: 61

#Citation: 660

H-Index: 14

G-Index: 23

Sociability: 6

Diversity: 2

Activity: 1

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  • 学生
  • 导师
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