基本信息
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Bio
Chuan-Hsi (Jason) Liu was born in Taiwan, R.O.C., in November 1965. He received the Ph.D. degree in electrical engineering from Arizona State University, Tempe, in 1997.
Afterwards, he joined United Microelectronics Corporation (UMC), Hsinchu, Taiwan, where he has been engaged in the research and development of gate oxide process and reliability, and was promoted to Section Manager in November 1999. In May 2000, he was sent to IBM, Hopewell Junction, NY, for a joint project (the development of 0.10 $\mu$m technology) between UMC, IBM, and Infineon, in which he has been dedicated to the growth and characterization of ultrathin gate dielectrics. He has published approximately 15 technical papers.
Research Interests
Papers共 126 篇Author StatisticsCo-AuthorSimilar Experts
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2023 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI-TSA/VLSI-DAT (2023)
E. Ray Hsieh, Yu Ming Luo,Yi Xiang Huang, Huan Shiang Su, Rui Qi Lin,Yu-Hsien Lin, Kai Hsiang Chang,Ting Ho Shen,Chuan Hsi Liu
2023 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, IRPS (2023)
Crystalsno. 4 (2022): 537-537
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Author Statistics
#Papers: 126
#Citation: 702
H-Index: 17
G-Index: 21
Sociability: 5
Diversity: 3
Activity: 7
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