C. Prentice - ASML SARL | 人才画像

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Investigating Process Variability at Ppm Level Using Advanced Massive Ebeam CD Metrology and Contour Analysis

B. Le-Gratiet, O. Mermet,C. Gardin, S. Desmoulins,T. Kiers,Y. Wang, P. Tang, D. Tien,F. Wang,C. Prentice, W. Tel,S. Hunsche

Metrology, Inspection, and Process Control for Microlithography XXXIII（2019）

引用11浏览0引用

Robust 2D Patterns Process Variability Assessment Using CD-SEM Contour Extraction Offline Metrology

Amine Lakcher,Bertrand Le-Gratiet,Julien Ducote,Pierre Fanton,Ton Kiers,Jan-Willem Gemmink,Stefan Hunsche,Christopher Prentice,Maxime Besacier

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2017)

引用11浏览0引用

Efficient Hybrid Metrology for Focus, Cd, and Overlay

W. T. Tel, B. Segers,R. Anunciado,Y. Zhang,P. Wong,T. Hasan,C. Prentice

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2017）

引用7浏览0引用

Advanced In-Production Hotspot Prediction and Monitoring with Micro-Topography

P. Fanton,T. Hasan,A. Lakcher,B. Le-Gratiet,C. Prentice,J. -G. Simiz,R. La Greca,L. Depre,S. Hunsche

International Convention on Information and Communication Technology, Electronics and Microelectroni...（2017）

引用4浏览0EIWOS引用

Enhanced 28nm FD-SOI Diffraction Based Overlay Metrology Based on Holistic Metrology Qualification

Florent Dettoni,Regis Bouyssou,Christophe Dezauzier,Jerome Depre,Steffen Meyer,Christopher Prentice

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2017）

引用3浏览0引用

Process Window Optimizer for Pattern Based Defect Prediction on 28nm Metal Layer

P. Fanton,R. La Greca,V. Jain,C. Prentice,J-G. Simiz,S. Hunsche,B. Le-Gratiet,L. Depre

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2016）

引用4浏览0引用

Verification and Application of Multi-Source Focus Quantification

J-G. Simiz,T. Hasan,F. Staals,B. Le-Gratiet,W. T. Tel,C. Prentice, J-W Gemmink,A. Tishchenko,Y. Jourlin

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2016)

引用4浏览0引用

An Evaluation of Edge Roll off on 28nm FDSOI (fully Depleted Silicon on Insulator) Product

M. Gatefait,B. Le-Gratiet,C. Prentice,T. Hasan

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2016）

引用1浏览0引用

Predictability and Impact of Product Layout Induced Topology on Across-Field Focus Control

J-G. Simiz,T. Hasan,F. Staals,B. Le-Gratiet, P. Gilgenkrantz,A. Villaret,F. Pasqualini,W. T. Tel,C. Prentice,A. Tishchenko

SPIE Proceedings Metrology, Inspection, and Process Control for Microlithography XXIX（2015）

引用4浏览0引用

Product Layout Induced Topography Effects on Intrafield Levelling

J-G. Simiz,T. Hasan,F. Staals,B. Le-Gratiet,W. T. Tel,C. Prentice,A. Tishchenko

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2015)

引用3浏览0引用

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