Chao-Ching Cheng

Chao-Ching Cheng received the B.S. degree in electronic engineering from Chang Gung University, Tao-Yuan, Taiwan, in 2003 and the M.S. degree in electronic engineering from National Chiao Tung University, Hsinchu, Taiwan, in 2005, where he is currently working toward the Ph.D. degree related to Ge and III–V MOSFETs in the Institute of Electronics. His main research interests include the study of the interface and device properties of Ge and III–V substrates integrating with high-$k$ materials, heteroepitaxial technology, and electrical characteristics of SiGe film on various III–V materials.