Charles R. Chambers - DuPont Elect Polymers LP

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论文共 9 篇作者统计合作学者相似作者

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Advanced Nanopatterning Using Raft Technology: History And Future Material Requirements

Michael T. Sheehan,William B. Farnham,Hoang V. Tran,Hiroshi Okazaki,Charles R. Chambers

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY（2014）

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Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology

Michael T Sheehan,William B Farnham,Charles R Chambers,Hoang V Tran,Hiroshi Okazaki,Yefim Brun,Matthew L Romberger,James R Sounik

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII（2011）

引用4浏览0引用

COMMITTEE MEMBERS David Boehm, LCSW PRESENT

Charles R. Chambers,Dolores Paulson,Elaine Yeatts,Evelyn B. Brown,Mark O'Shea,Robin G. Parks,Susan Ward,Ellen Zagorin

msra（2009）

引用23浏览0引用

Advances in Tfe Based Fluoropolymers for 157nm Lithography: A Progress Report

I Sharif,D DesMarteau,L Ford,G Shafer,B Thomas,W Conley,P Zimmerman,D Miller,GS Lee,C Chambers,B Trinque,T Chiba,B Osborn,CG Willson

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2 (2003): 33-42

引用8浏览0引用

Dissolution Inhibitors for 157 Nm Lithography: A Progress Report

W Conley,D Miller,C Chambers,BC Trinque,B Osborn,T Chiba,P Zimmerman,R Dammel,A Romano,CG Willson

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY（2002）

引用15浏览0引用

The Design of Resist Materials for 157nm Lithography

C. Grant Willson,Brian C. Trinque,Brian P. Osborn,Charles R. Chambers,Yu-Tsai Hsieh,Takashi Chiba,Paul Zimmerman,Daniel Miller,Willard Conley

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY（2002）

引用33浏览0引用

Dissolution Inhibitors for 157-Nm Microlithography

W Conley,D Miller,C Chambers,B Osborn,RJ Hung,HV Tran,BC Trinque,M Pinnow,T Chiba, S McDonald,P Zimmerman,R Dammel,A Romano,CG Willson

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2002)

引用5浏览0引用

Fluoropolymer Resist Materials for 157nm Microlithography

Hoang V. Tran,Raymond J. Hung,Takashi Chiba,Shintaro Yamada,Thomas Mrozek,Yu-Tsai Hsieh,Charles R. Chambers,Brian P. Osborn,Brian C. Trinque,Matthew J. Pinnow,Daniel P. Sanders,Eric F. Connor,Robert H. Grubbs,Will Conley,Scott A. MacDonald,C. Grant Willson

Journal of Photopolymer Science and Technology（2001）

引用39浏览0引用

Developments in materials for 157nm photoresists

W Conley,K Dean,D Miller,G Rich,V Graffenberg, S Patel,SH Lin, A Jamieson, R Hung,S Yamada,M Pinnow, S MacDonald,C Chambers, B Osborne,K Patterson, M Somervell,B Trinque,HV Tran, S Cho,T Chiba,J Byers, B Tomas,G Shafer,D DesMarteau, J Klopp, J Frechet,D Sanders,R Grubbs,C Ober,H Korner,CG Willson

SOLID STATE TECHNOLOGY（2001）

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