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Papers共 138 篇Author StatisticsCo-AuthorSimilar Experts

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Substantial Dose Reduction Using Dry Deposited Underlayer for EUV Lithography While Maintaining Roughness and Minimizing Defects
Achintya Kundu, Mihir Gupta,Danilo De Simone,Pieter Vanelderen,Hyo Seon Suh,David De Roest, Dennis Christy, Fatemeh Davodi, Kishan Patel, Steaphan Wallace, Yiting Sun,Yoann Tomczak
International Conference on Extreme Ultraviolet Lithography 2024 (2024)
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Author Statistics

#Papers: 138

#Citation: 905

H-Index: 15

G-Index: 22

Sociability: 6

Diversity: 2

Activity: 13

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