基本信息
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个人简介
RESEARCH INTERESTS
Low Temperature Plasmas, Laser Physics and Spectroscopy, Plasma Chemistry, Plasma and Photochemical Materials Processing, Amorphous Thin Films, Pulse Power Plasmas, Environmental and Medical Applications of Plasmas
RESEARCH AREAS
Applied electromagnetics, MEMS and microsystems, optics and photonics, quantum science and engineering, integrated circuit design and VLSI, plasma science and engineering, energy and power.
AREAS OF SPECIALITY
Computational electromagnetics, microfluidics and gas/chemical, MEMS technology and packaging, optoelectronics, plasma fabrication and plasma-based MEMS devices, plasma materials processing of microelectronics, plasma science and engineering; solid-state energy conversion technologies.
Low Temperature Plasmas, Laser Physics and Spectroscopy, Plasma Chemistry, Plasma and Photochemical Materials Processing, Amorphous Thin Films, Pulse Power Plasmas, Environmental and Medical Applications of Plasmas
RESEARCH AREAS
Applied electromagnetics, MEMS and microsystems, optics and photonics, quantum science and engineering, integrated circuit design and VLSI, plasma science and engineering, energy and power.
AREAS OF SPECIALITY
Computational electromagnetics, microfluidics and gas/chemical, MEMS technology and packaging, optoelectronics, plasma fabrication and plasma-based MEMS devices, plasma materials processing of microelectronics, plasma science and engineering; solid-state energy conversion technologies.
研究兴趣
论文共 910 篇作者统计合作学者相似作者
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时间
引用量
主题
期刊级别
合作者
合作机构
Lab on a chip (2025)
Peter J Bruggeman,Renee R Frontiera, Uwe Kortshagen,Mark J Kushner,Suljo Linic,George C Schatz, Himashi Andaraarachchi,Subhajyoti Chaudhuri,Han-Ting Chen, Collin D Clay, Tiago C Dias, Scott Doyle,Leighton O Jones,Mackenzie Meyer,Chelsea M Mueller, Jae Hyun Nam, Astrid Raisanen,Christopher C Rich,Tanubhav Srivastava,Chi Xu, Dongxuan Xu, Yi Zhang
The Journal of chemical physicsno. 7 (2025)
PLASMA SOURCES SCIENCE & TECHNOLOGYno. 2 (2024)
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomenano. 4 (2024)
JOURNAL OF PHYSICS D-APPLIED PHYSICSno. 43 (2024)
The Journal of Physical Chemistry Ano. 13 (2024): 2656-2671
Gottlieb S. Oehrlein, Stephan M. Brandstadter,Robert L. Bruce,Jane P. Chang, Jessica C. Demott,Vincent M. Donnelly,Remi Dussart,Andreas Fischer,Richard A. Gottscho,Satoshi Hamaguchi,Masanobu Honda,Masaru Hori,Kenji Ishikawa, Steven G. Jaloviar,Keren J. Kanarik,Kazuhiro Karahashi,Akiteru Ko, Hiten Kothari,Nobuyuki Kuboi,Mark J. Kushner,Thorsten Lill,Pingshan Luan,Ali Mesbah,Eric Miller, Shoubhanik Nath,Yoshinobu Ohya,Mitsuhiro Omura,Chanhoon Park, John Poulose,Shahid Rauf,Makoto Sekine, Taylor G. Smith,Nathan Stafford, Theo Standaert,Peter L. G. Ventzek
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Bno. 4 (2024)
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作者统计
#Papers: 910
#Citation: 29111
H-Index: 77
G-Index: 138
Sociability: 7
Diversity: 2
Activity: 36
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