基本信息
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个人简介
Peter Evanschitzky received the Diploma in electrical engineering from the Universität des Saarlandes, Saarbrücken, Germany, and the Ph.D. degree in the field of optical surface measurement techniques from the Technische Universität München, Munich, Germany, where he developed a simulator for interferometrical speckle measurement systems and a new interferometrical surface shape measurement system for rough surfaces.
He is currently a scientist with the Fraunhofer Institute for Integrated Systems and Device Technology (IISB), Erlangen, Germany. His field of research is lithography simulation. He has coauthored the lithography simulator Dr. LiTHO.
研究兴趣
论文共 68 篇作者统计合作学者相似作者
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Journal of Micro/Nanopatterning, Materials, and Metrologyno. 01 (2024)
37TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE (2022)
Optical and EUV Nanolithography XXXV (2022)
Journal of Micro/Nanopatterning, Materials, and Metrologyno. 02 (2021)
International Conference on Extreme Ultraviolet Lithography 2021 (2021)
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 4 (2021)
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作者统计
#Papers: 68
#Citation: 922
H-Index: 18
G-Index: 25
Sociability: 5
Diversity: 2
Activity: 1
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