Ravikumar Ramachandran IBM Systems, Hopewell Junction, NY 12533 USA (ravikuma@us.ibm.com). Dr. Ramachandran is a Senior Technical Staff Member in the IBM Systems division and an elected member of the IBM Academy of Technology. He received a B.Tech. degree from the Indian Institute of Technology, Kanpur, India, in 1989, and M.S. and Ph.D. degrees in material science and engineering from the University of California at Berkeley in 1992 and 1996, respectively. He subsequently worked for Siemens Semiconductor and Infineon Technologies at the IBM DRAM Development Alliance in Hopewell Junction, NY, USA. Since 2003, he has been working with IBM at the Semiconductor Research Development Center, working on different technology nodes starting from the 90-nm SOI technology. He is a recipient of multiple IBM outstanding technical achievement awards, and, in 2016, was recognized by the IBM Research division for his extraordinary contributions to the high-K metal gate technology that had an impact on products at 32-nm, 28-nm, and 22-nm generations for IBM and Alliance partners. He is author or coauthor on multiple publications and U.S. patents that have been incorporated in IBM processors.