Ryoung-Han Kim - Globalfoundries Inc

基本信息

浏览量：20

职业迁徙

个人简介

暂无内容

研究兴趣

论文共 94 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选

Curvilinear Standard Cell Design for Semiconductor Manufacturing

Ryoung-Han Kim,Soobin Hwang,Apoorva Oak,Yasser Shirazi, Hsinlan Chang,Kiho Yang,Gioele Mirabelli

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURINGno. 2 (2024): 152-159

引用0浏览0EIWOS引用

The Influence of Reflectivity on EUV Lithography Performance of Low-N and Binary Masks for Random Logic Via Implementation

Ling Ee Tan, Fergo Treska,Werner Gillijns,Jeroen Van de Kerkhove,Peter De Bisschop,Vicky Philipsen,Ryoung-Han Kim

Photomask Technology 2024 (2024)

引用0浏览0引用

Source Mask Optimization (SMO) Study for High-Na EUV Lithography to Achieve Single Patterning on Random Logic Metal

Soobin Hwang,Werner Gillijins,Stefan de Gendt,Ryoung-han Kim

DTCO AND COMPUTATIONAL PATTERNING III (2024)

引用0浏览0引用

Study of EUV Stochastic Defect on Wafer Yield

Yi-Pei Tsai, Chieh-Miao Chang,Yi-Han Chang,Apoorva Oak,Darko Trivkovic,Ryoung-Han Kim

DTCO AND COMPUTATIONAL PATTERNING III (2024)

引用0浏览0引用

Logic and Memory Patterning Breakthrough Using High-NA Lithography

Victor M. Blanco Carballo,Syamashree Roy, Bhavishya Chowrira,Van Tuong Pham, Johan Wouters, Shubhankar Das,Stefan Decoster,Philippe Leray, Ru-Gun Liu,Kurt Ronse,Geert Vandenberghe,Ardavan Niroomand,Philippe Foubert, Vito Daniele Rutigliani,Hyo Seon Suh,Mihir Gupta,Danilo De Simone,Mircea Dusa,Christophe Beral,Vicky Philipsen,Vincent Wiaux,Joern Holger Franke,Joost Bekaert,Balakumar Baskaran,Werner Gillijns,Ryoung han Kim,Yasser Sherazi, Hemant Vats, Miroslav Cupak, Carol Chang, Yun-Jing Lin, Jeonghoon Lee,Soobin Hwang,Kiho Yang,Kenichi Miyaguchi

Photomask Technology 2024 (2024)

引用0浏览0引用

Manufacturing-friendly Curvilinear Standard Cell Design

Ryoung-han Kim,Apoorva Oak,Yasser Sherazi,Gioele Mirabelli,Soobin Hwang,Kiho Yang, Hsinlan Chang

DTCO AND COMPUTATIONAL PATTERNING III (2024)

引用1浏览0引用

Exploring High-Na EUV Mask Specification for Logic Metal

Kenichi Miyaguchi,Soobin Hwang,Apoorva Oak,Ryoung-han Kim

Photomask Japan 2024 XXX Symposium on Photomask and Next-Generation Lithography Mask Technology (2024)

引用0浏览0引用

Single Mask Solution to Pattern BLP and SNLP Using 0.33NA EUV for Next-Generation DRAM Manufacturing

Kaushik Sah,Andrew Cross,Sayantan Das,Roberto Fallica,Jeonghoon Lee,Ryoung-Han Kim,Sandip Halder,Ethan Maguire,Ana-Maria Armeanu,Monica Sears,Neal Lafferty,Vlad Liubich,Chih- Wei,Germain Fenger

DTCO and Computational Patterning II (2023)

引用0浏览0引用

EUV Single Patterning of Random Logic Via Using Bright Field Mask

Ling Ee Tan,Werner Gillijns,Jae Uk Lee,Dongbo Xu,Jeroen van de Kerkhove,Vicky Philipsen,Ryoung-Han Kim

Optical and EUV Nanolithography XXXVI (2023)

引用0浏览0引用

EUV Based Multi-Patterning Schemes for Advanced DRAM Nodes

Sayantan Das,Kaushik Sah,Roberto Fallica, Zhijin Chen,Sandip Halder,Andrew Cross,Danilo De Simone, Fergo Treska,Philippe Leray,Ryoung Han Kim,Ethan Maguire,Chih- Wei,Germain Fenger,Neal Lafferty,Jeonghoon Lee

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX（2022）

引用2浏览0引用

加载更多

作者统计

合作学者

合作机构

D-Core

合作者
学生
导师

暂无相似学者，你可以通过学者研究领域进行搜索筛选

数据免责声明

页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn