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论文共 171 篇作者统计合作学者相似作者

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ArFi Speckle Reduction and Impact on Local CDU
Will Conley,Stephen Hsu,Michael Crouse, Dylan Martin, Rajasekhar Rao, Natalllia Karlitskaya, Dirk van Leuken,Jan Baselmans,Marieke van Veen, Edwin de Jong, Birgitt Hepp,Rasmus Nielsen, Eric Bakker
Optical and EUV Nanolithography XXXVII (2024)
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KrF Multi-focal Imaging System for Advanced and Legacy Applications
Will Conley, G. G. Padmabandu,Yzzer Roman, Yingbo Zhao, Toufiq Aman, James Bonafede, Emmanuel Rausa,Rasmus Nielsen, Ijen van Mil,Rongkuo Zhao
Optical and EUV Nanolithography XXXV (2022)
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A Novel Solution on KrF Pixel Layer with Thick Photo Resist (PR) by Single Exposure Multi-Focal Imaging (SE MFI) Technique
Zhenhai Yao, Lequn Jin, Yuhua Li, Maoqun Jiang,Fabin Huang, Min Fang, Xichen Sheng,Rongkuo Zhao,Michael Crouse,Chris Kaplan,Dongqing Zhang, Dongxiang Shi, Zhonghua Xu, Chaoqun Guo,Pieter Scheijgrond, Xiaoyang Jason Li,Stephen Hsu,Will Conley, Zhen Tang
OPTICAL AND EUV NANOLITHOGRAPHY XXXV (2022)
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Holistic Imaging for Yield Improvements Enabled by High-Availability, and Low-Environmental Impact Cymer ArFi Lightsource
Siqi Luo,Will Conley, James Bonefede, Natallia Karlitskaya,Thomas Yang, David Manley, peter Oh, Rajasekhar Rao, Marc Sells, Josh thornes
Photomask Technology 2022 (2022)
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Quantifying Global and Local CD Variation for an Advanced 3D NAND Layer (conference Presentation)
Will Conley,Yaobin Feng,Zhiyang Song,Moran Guo, Jun He, Longxia Guo, Gang Xu,Simon Hsieh, James Bonafede,Stephen Hsu,Austin Peng,Jun Wei Lu,Victor Peng, Beeri Nativ, Fei Jia, Herman Nicolai, Ijen van Mil
Optical Microlithography XXXII (2019)
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Advanced light source technologies for memory and logic processes (Conference Presentation)
Theodore Cacouris, Josh Thornes, Marc Sells,Aleks Simic,Will Conley
Optical Microlithography XXXI (2018)
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作者统计

#Papers: 171

#Citation: 1872

H-Index: 23

G-Index: 35

Sociability: 6

Diversity: 2

Activity: 0

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