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Papers共 21 篇Author StatisticsCo-AuthorSimilar Experts

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$\Textit{c}$ -Axis Oriented HZO on Flat Amorphous TiN Achieving High Uniformity, Breakdown Field, Final 2P $_{\text{r}}$ , and Endurance
Zefu Zhao, Yu-Tsung Liao,Yu-Rui Chen,Yun-Wen Chen,Wan-Hsuan Hsieh,Jer-Fu Wang, Yu-An Chen, Hao-Yi Lu, Wei-Teng Hsu, Dai-Ying Lee,Ming-Hsiu Lee,C. W. Liu
IEEE TRANSACTIONS ON ELECTRON DEVICESno. 1 (2025): 222-227
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WNxCy VT Tuning of Split Gate Nanosheet CFETs with Dual Work Function Metals Achieving 0.93 VT Match/Improved 0.24V Noise Margin/Record Gain of 61V/V
Bo-Wei Huang,Chun-Yi Cheng,Wan-Hsuan Hsieh,Yu-Rui Chen,Wei-Jen Chen,Yi-Chun Liu, Min-Kuan Lin, Ying-Qi Liu, Hao-Yi Lu, Yi Huang, Ding-Wei Lin,C. W. Liu
2024 IEEE International Electron Devices Meeting (IEDM)pp.1-4, (2024)
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Enhanced Electrical Performance of Ultrathin Body Nanosheets
Bo-Wei Huang,Yu-Rui Chen,Tao Chou,Hsin-Cheng Lin,Chien-Te Tu,Yi-Chun Liu,Wan-Hsuan Hsieh,Wei-Jen Chen, Min-Kuan Lin, Ying-Qi Liu,Li-Kai Wang,Hung-Chun Chou, Yi Huang, Ding-Wei Lin,C. W. Liu
2024 IEEE SILICON NANOELECTRONICS WORKSHOP, SNW 2024pp.7-8, (2024)
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Engineering HZO by Flat Amorphous TiN with 0.3nm Roughness Achieving Uniform C-Axis Alignment, Record High Breakdown Field (~10nm HZO), and Record Final 2pr of 56 Μc/cm2 with Endurance > 4E12
Zefu Zhao,Yu-Rui Chen, Yu-Tsung Liao,Yun-Wen Chen,Wan-Hsuan Hsieh,Jer-Fu Wang, Yu-An Chen, Hao-Yi Lu, Wei-Teng Hsu, Dai-Ying Lee,Ming-Hsiu Lee,C. W. Liu
2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)pp.1-2, (2024)
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