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STLM: A Sidewall TLM Structure for Accurate Extraction of Ultralow Specific Contact Resistivity

Kausik Majumdar,Saikumar Vivekanand,Craig Huffman,Ken Matthews,Tat Ngai, Chien Hao Chen,Rock Hyun Baek,Wei Yip Loh,Martin Rodgers,Harlan Stamper,Steven Gausepohl,Chang Yong Kang,Chris Hobbs,Paul D. Kirsch

IEEE Electron Device Letters（2013）

Cited 18|Views0
Key words
Contact resistance,ohmic contact,specific contact resistivity,current crowding,transfer length method
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