Development of a Two-Chamber Process for Self-Assembling a Fluorooctatrichlorosilane Monolayer for the Nanoimprinting of Full-Track Nanopatterns with a 35 Nm Half Pitch.
Journal of Nanoscience and Nanotechnology（2011）
关键词
Nanoimprint,SAM,Self-Assembled Monolayer,Sticking,Nanopattern
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要