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Advanced TCAD Simulation of Local Mismatch in 14nm CMOS Technology FinFETs

E. M. Bazizi, I. Chakarov,T. Herrmann,A. Zaka, L. Jiang, X. Wu,S. M. Pandey,F. Benistant,D. Reid,A. R. Brown,C. Alexander,C. Millar,A. Asenov

2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)（2015）

Cited 4|Views22
Key words
14nm technology,FinFET,variability,DTCO
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