Influence of an In-Situ Formed Interfacial SiNx Layer on the Electrical Performance and Thermal Stability of High-k HfO2 FilmsSug H. Hong,Jeong Hwan Kim,Taejoo Park,J.Y Won,R.J Jung,Seong Keun Kim,C.S. Hwang, M. J. ChoECS Transactions（2006）引用 1|浏览8AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
