(Invited) Conformal Metal Gate Process Technology for 14nm Logic Node and Below
S N Ganguli,Min Chen,Yeongjyi Lei,A Brand,Atif Noori,Jeffrey W Anthis,Daniel T Thompson,Naomi Yoshida,Ming Xu, Melissa P Allen,Hyunsoo Yang,J Gelatos,Sang Ho Yu,Mengfan Chang,Srinivas Gandikota, Wenhua Tang, Xiaomin Lu, X Fu mag（2013）
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