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Solution for High-Order Distortion on Extreme Illumination Condition Using Computational Prediction Method

Young Seog Kang,Hunhwan Ha,Jang-Sun Kim,Ju Hee Shin,Young Ha Kim,Young Sun Nam,Young-Sin Choi, Cedric Affentauschegg,Rob W. van der Heijden,Umar Rizvi,Bernd Geh,Eric Janda,Jan Baselmans,Stefan van der Sanden,Oh-Sung Kwon,Mariya Ponomarenko,Daan Slotboom

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2015）

Cited 6|Views4
Key words
lens aberrations,extreme illumination,overlay,process control,computational lithography
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