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Model-based Mask Verification on Critical 45nm Logic Masks

F. Sundermann,F. Foussadier,T. Takigawa,J. Wiley, A. Vacca,L. Depre, G. Chen,S. Bai,J-S Wang, R. Howell, V. Arnoux, K. Hayano,S. Narukawa, S. Kawashima, H. Mohri,N. Hayashi, H. Miyashita,Y. Trouiller, F. Robert,F. Vautrin,G. Kerrien,J. Planchot,C. Martinelli, J. L. Di-Maria,V. Farys, B. Vandewalle,L. Perraud,J. C. Le Denmat,A. Villaret,C. Gardin,E. Yesilada,M. Saied

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2008）

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