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Intensive Optimization of Masks and Sources for 22nm Lithography

Alan E. Rosenbluth,David O. Melville,Kehan Tian,Saeed Bagheri,Jaione Tirapu-Azpiroz,Kafai Lai,Andreas Waechter,Tadanobu Inoue,Laszlo Ladanyi,Francisco Barahona,Katya Scheinberg,Masaharu Sakamoto,Hidemasa Muta,Emily Gallagher,Tom Faure,Michael Hibbs,Alexander Tritchkov,Yuri Granik

SPIE Proceedings Optical Microlithography XXII（2009）

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