Self-supporting Tantalum Masks for Deep X-Ray Lithography with Synchrotron Radiation

SV Litvina,VG Kanaev, EG Larionova, NV Glazunova, LP Gromova, VI Yurchenko,NA Timchenko,LA Mezentseva,VP Nazmov,VF Pindyurin

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（1999）

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Key words

X-ray mask,synchrotron radiation,contrast,reactive ion etching,plasma-chemical deposition

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