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Sn DPP Source-Collector Modules: Status of Alpha Resources, Beta Developments, and the Scalability to HVM

Marc Corthout,Rolf Apetz,Jesko Brudermann,Marcel Damen,Guenther Derra,Oliver Franken,Jeroen Jonkers,Juergen Klein,Felix Kuepper,Arnaud Mader,Willi Neff, Hans Schuermann,Guido Schriever,Max Schuermann,Guido Siemons,Rob Snijkers,Dominik Vaudrevange,Erik Wagenaars, Pieter van de Wel,Masaki Yoshioka,Peter Zink,Oliver Zitzen

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2008）

引用 22|浏览11
关键词
EUV source,gas discharge plasma,tin,DPP,EUV Lithography
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