Applicability of Global Source Mask Optimization to 22/20nm Node and Beyond

Kehan Tian,Moutaz Fakhry,Aasutosh Dave,Alexander Tritchkov,Jaione Tirapu-Azpiroz,Alan E. Rosenbluth,David Melville,Masaharu Sakamoto,Tadanobu Inoue,Scott Mansfield,Alexander Wei,Young Kim, Bruce Durgan,Kostas Adam,Gabriel Berger,Gandharv Bhatara,Jason Meiring,Henning Haffner,Byung-Sung Kim

OPTICAL MICROLITHOGRAPHY XXIV（2011）

引用 16|浏览60

关键词

Source mask optimization (SMO),source optimization,mask optimization,pixelated illumination,programmable illumination,resolution enhancement techniques (RETs),optical proximity correction (OPC),global optimization

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