谷歌浏览器插件
订阅小程序
在清言上使用
VIPCreated with Sketch.

Device Specific Characterization of Yield Limiting Pattern Geometries by Combining Layout Profiling with High Sensitivity Wafer Inspection

Jean-Christophe Le Denmat,Laurent Tetar,Pierre Fanton,Emek Yesilada,Pierre-Jerome Goirand, Narayani Narasimhan,Paolo Parisi, Vijay Ramachandran, Sagar A. Kekare

Advanced Semiconductor Manufacturing Conference（2015）

引用 3|浏览6
关键词
Advanced Patterning,Design-for-Manufacturing,Yield Enhancement,Yield Management
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要