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The Assessment of the Impact of Mask Pattern Shape Variation on the Opc-Modeling by Using Sem-Contours from Wafer and Mask

Daisuke Hibino,Hiroyuki Shindo,Yutaka Hojyo,Thuy Do,Aasutosh Dave,Timothy Lin,Ir Kusnadi,John L. Sturtevant

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2011）

Cited 5|Views3
Key words
OPC,Hybrid model,2D,Corner rounding,CD measurements,SEM-contour,Mask
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