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15Nm Hp Patterning with Euv and Sadp: Key Contributors for Improvement of Lwr, Ler and Cdu

K. Xu,L. Souriau,D. Hellin,J. Versluijs,P. Wong,D. Vangoidsenhoven,N. Vandenbroeck,H. Dekkers, X. P. Shi,J. Albert,C. L. Tan,J. Vertommen,B. Coenegrachts, I. Orain,Y. Kimura,V. Wiaux,W. Boullart

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING II（2013）

Cited 8|Views68
Key words
EUVL,SADP,15nm HP,LWR,LER,CDU
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