Assessment of Negative Tone Development Challenges
Sohan Singh Mehta,Yongan Xu,Guillaume Landie,Vikrant Chauhan,Sean D. Burns, Peggy Lawson,Bassem Hamieh,Jerome Wandell,Martin Glodde,Yu Yang Sun,Mark Kelling,Alan Thomas,Jeong Soo Kim,James Chen,Hirokazu Kato,Chiahsun Tseng,Chiew-seng Koay,Yoshinori Matsui,Martin Burkhardt,Yunpeng Yin,David Horak,Shyng-Tsong Chen,Yann Mignot,Yannick Loquet,Matthew Colburn,John Arnold,Terry Spooner,Lior Huli,Dave Hetzer,Jason Cantone,Shinichiro Kawakami,Shannon Dunn Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2012）
关键词
Negative tone development,adhesion,SiARC,resist thickness loss
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