Evaluating Printability of Buried Native Euv Mask Phase Defects Through A Modeling and Simulation Approach

Mihir Upadhyaya,Vibhu Jindal,Adarsh Basavalingappa,Henry Herbol,Jenah Harris-Jones,Il-Yong Jang,Kenneth A. Goldberg,Iacopo Mochi,Sajan Marokkey,Wolfgang Demmerle,Thomas V. Pistor,Gregory Denbeaux

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2015）

Cited 4|Views29

Key words

extreme ultraviolet lithography,extreme ultraviolet mask defects,defect printability,level-set growth model,Actinic Inspection Tool,waveguide simulations

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