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Co-optimization of Lithographic and Patterning Processes for Improved EPE Performance

Mark J. Maslow,Vadim Timoshkov,Ton Kiers, Tae Kwon Jee, Peter de Loijer,Shinya Morikita,Marc Demand,Andrew W. Metz,Soichiro Okada,Kaushik A. Kumar,Serge Biesemans,Hidetami Yaegashi,Paolo Di Lorenzo,Joost P. Bekaert,Ming Mao,Christophe Beral,Stephane Lariviere

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VI（2017）

Cited 9|Views16
Key words
Spacer,SAQP,EPE,EUV,Block,Local CDU
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