Mix-and-match Considerations for EUV Insertion in N7 HVM

Xuemei Chen,Allen Gabor,Pavan Samudrala,Sheldon Meyers,Erik Hosler,Richard Johnson,Nelson Felix

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2017）

引用 3|浏览11

关键词

N7 EUV,Cross-Platform Mix and Match Overlay Control,Higher-Order Intra-field Scanner Correction,High-Order Wafer-to-Wafer Correction,Intra-field Sample Plan Optimization

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