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Methods to Lower the Resistivity of Ruthenium Interconnects at 7 Nm Node and Beyond

Xunyuan Zhang,Huai Huang,Raghuveer Patlolla, Frank W. Mont,Xuan Lin,Mark Raymond,Cathy Labelle,E. Todd Ryan,Donald Canaperi, Theodore E. Standaert,Terry Spooner,Griselda Bonilla,Daniel Edelstein

2017 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE (IITC)（2017）

Cited 14|Views85
Key words
Ruthenium,Interconnects,Resistivity,Scattering
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