Middle of line RC performance study at the 7 nm node

Susan Su-Chen Fan,James Chen,Vimal Kamineni,Xunyuan Zhang,Mark Raymond,Cathy Labelle

2017 IEEE International Interconnect Technology Conference (IITC)（2017）

引用 22|浏览103

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middle-of-the-line RC performance,MOL resistance,single stage driver circuit,device delay,metallization,source drain contact level,MOL local interconnect level

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