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Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes

Hiroyuki Miyazoe,Nathan Marchack,Robert L. Bruce,Yu Zhu,Masahiro Nakamura,Eric Miller,Sivananda Kanakasabapathy,Takefumi Suzuki,Azumi Ito,Hirokazu Matsumoto,Sebastian U. Engelmann,Eric A. Joseph

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B（2018）

引用 13|浏览84
关键词
hydrofluorocarbons iii,ch3f,c4h9f
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