WeChat Mini Program
Old Version Features

Relation Between Etching Profile and Voltage–current Shape of Sintered SiC Etching by Atmospheric Pressure Plasma

Plasma Science and Technology(2019)

Cited 4|Views7
Key words
dielectric barrier discharge,silicon carbide,plasma etching,filament discharge,surface charge
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined