Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
Eswar Ramanathan,Lei Jiang,Qanit Takmeel, Silvestre MaryClaire, AnbuSelvam K. M. Mahalingam, Somnath Ghosh,Keith Donegan, Ashwini Chandrasekar,Sunil Singh, Henrik Johanson, Daniel Damjanovic,ZhiGuo Sun, Anirvan Sircar, Sang-Kee Eah,Colin Bombardier, Adam DaSilva, Brendan O'Brien,Alycia Roux, Brett Cucci,Ordonio Christopher,Christa Montgomery,Vandana Venkatasubramanian,Vijaya Rana,Jay Mody,Joseph Shepard,Craig Child, Bradley Morganfeld, Rebekah Sheraw 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)（2019）
关键词
Hard mask,Sacrificial layer,Self-aligned via,Metallization
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