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14-Nm FinFET Technology for Analog and RF Applications

Jagar Singh,J. Ciavatti,K. Sundaram,J. S. Wong,A. Bandyopadhyay,X. Zhang,S. Li,A. Bellaouar,J. Watts, J. G. Lee,S. B. Samavedam

IEEE TRANSACTIONS ON ELECTRON DEVICES（2018）

Cited 106|Views20
Key words
5G mobile communication,14-nm and 28-nm technology,deep n-well isolation,FinFET,logic devices,RF CMOS,wireless communication
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