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Impurity Sources and Fluxes in W7-X: from the Plasma-Facing Components to the Edge Layer

E. Wang,S. Brezinsek,S. Sereda,B. Buttenschoen,T. Barbui,C. P. Dhard,M. Endler,O. Ford,E. Flom,K. C. Hammond,M. Jakubowski,M. Krychowiak,P. Kornejew,R. Koenig,Y. Liang,M. Mayer,D. Naujoks,O. Neubauer,J. Oelmann,M. Rasinski,V. R. Winters,A. Goriaev,T. Wauters,Y. Wei,D. Zhang

PHYSICA SCRIPTA（2020）

Cited 19|Views20
Key words
impurity,carbon chemical sputtering,CH4,injection,W7-X
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