Study of Related Yield Loss and Mechanism of NOR Flash Self-Align-Source

Tian Zhi, Youhua Qin, Gu Zhen,Juanjuan Li, Qiwei Wang,Haoyu Chen

2020 China Semiconductor Technology International Conference (CSTIC)（2020）

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关键词

floating NOR flash cell,rapid thermal oxide,SAS loop implant,SAS active area,silicon dislocation,check-board yield failure,voltage nonuniformity,self-align-source area,photo residues,wafer center region,failure pattern,NOR flash self-align-source,yield loss

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