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    • Influence of Material Type and Surface Roughness of Substrate on Boronization and Its Performance

    Xiaorang Tian,Chuizhou Meng,Xin Zhao, Bing Liu,Guanchao Zhao,Ge Nie, Guoyun Yang,Guosong Zhang,Peide Han

    Vacuum（2021）SCI 2区SCI 3区

    Chinese Acad Sci | ENN Sci & Dev Co Ltd | Univ Sci & Technol

    Cited 5|Views9
    Abstract
    Diborane (B2H6) glow discharges were carried out for the study of influence of material type and surface roughness of substrate on the boronization and its plasma performance. We found that for the stainless steel (SS), the surface roughness should be smaller than 0.8 ?m with an optimal value of 0.4 ?m, in order to reach a maximum binding force of 320 N/m. The effective boron (B) film growth by using the same parameter was also realized on both the surface of SS and Si substrate, but not on the Cu substrate, mainly due to the easy enrichment of O element on Cu surface through formation of the B?O bond, which prevents subsequent formation of the B?B bond. After boronization, the partial pressure of residual gases of H2O, CO2, CO and O2 was reduced by 47%, 80%, 56% and 33%, respectively, indicating the successful reduction of O and C impurities in the chamber.
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    Boronization,Boron film,Surface roughness,Substrate material,Impurity control
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    【要点】：该论文研究了材料类型和基底表面粗糙度对硼化过程及其性能的影响，发现不锈钢表面粗糙度小于0.8微米且优值为0.4微米时，可达到最大的附着力320 N/m；在相同参数下，硼化膜有效生长可实现于不锈钢和硅基底，但在铜基底上无法实现，主要是由于铜表面容易通过B-O键形成氧元素富集，阻碍后续B-B键的形成；硼化处理后，降低了反应室中H2O、CO2、CO和O2的残余气体分压，分别减少了47%、80%、56%和33%，表明成功地降低了氧和碳杂质。
    

    【方法】：采用Diborane (B2H6)辉光放电方法研究。
    

    【实验】：实验在不同的材料类型和表面粗糙度的基底上进行硼化处理，使用了不锈钢、硅和铜三种不同的基底材料，并对比了处理前后的性能差异。数据集名称未提及，但实验结果表明了表面粗糙度、材料类型与硼化效果之间的关系。
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