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溅射功率对二氧化锆薄膜结构及力学性能的影响研究

Bulletin of the Chinese ceramic society(2019)

Cited 4|Views26
Abstract
为了研究溅射功率对二氧化锆薄膜结构及力学性能的影响,使用射频反应磁控溅射技术在常温下以玻璃为基底使用不同功率镀制了800 nm左右的ZrO2薄膜.利用X射线衍射仪(XRD)和扫描电子显微镜(SEM)对样品结晶情况,表面和断面形貌进行表征,结果显示镀制的ZrO2薄膜均为单斜晶体,晶粒尺寸变化不大;随着功率的升高,薄膜从纳米晶结构转变为柱状晶结构.使用纳米压痕仪对薄膜表面进行硬度和弹性模量测试,发现随着功率升高,硬度和弹性模量均出现上升趋势,进一步增加功率出现下降,再上升的变化;在沉积功率为65 W时,可得到厚度为800 nm,弹性恢复量,硬度,弹性模量和塑性指数均最高,分别为88.55%,25.42 GPa,228.6 GPa和0.314的ZrO2薄膜.不同的溅射功率会镀制出不同结构的二氧化锆薄膜,在常温低功率溅射条件下二氧化锆薄膜结构是影响其力学性能的重要因素.
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要点】:本文研究了溅射功率对二氧化锆薄膜结构和力学性能的影响,发现不同溅射功率会导致薄膜结构变化,从而影响其力学性能。

方法】:采用射频反应磁控溅射技术在玻璃基底上镀制不同功率下的ZrO2薄膜,并利用XRD和SEM进行结构表征,纳米压痕仪测试力学性能。

实验】:在常温下,通过不同功率溅射制备了800 nm厚的ZrO2薄膜,使用XRD和SEM分析薄膜的结晶情况和形貌,纳米压痕测试得出在65 W功率下薄膜的弹性恢复量、硬度、弹性模量和塑性指数达到最高,数据集名称未提及。