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Formation of Laterally Ordered Arrays of Noble Metal Nanocavities for SERS Substrates by Using Interference Photolithography

V. A. Dan'ko,I. Z. Indutnyi,V. Mynko,P. M. Lytvyn,M. Lukaniuk,H. Bandarenka, A. L. Dolgyi,S. Redko

Semiconductor Physics Quantum Electronics & Optoelectronics（2021）

引用 5|浏览4
关键词
SERS,interference lithography,chalcogenide photoresist,noble metal nanocavities
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