中子半影成像的数值模拟
High Power Laser and Particle Beams（2006）
Department of Engineering Physics
Abstract
半影成像具有灵敏度高的特点,该技术是未来惯性约束聚变(ICF)中子成像的主要技术路线.基于中子半影成像的基本要求,利用蒙特卡罗方法,采用偏移抽样法和面通量的体通量替代技巧,模拟中子在半影成像系统中的输运,得到2维图像,并通过图像重建程序得到重建的源区图像.利用模拟结果,对编码孔屏蔽材料的选择和外径设计进行了初步优化,最终选择5 cm厚的钨屏蔽材料,其编码孔外径为1 cm.
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