EUV Mask Synthesis with Rigorous ILT for Process Window Improvement

Kyle Braam, Kosta Selinidis,Wolfgang Hoppe, Hongyuan Cai,Guangming Xiao

DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY XIII（2019）

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关键词

Lithography Simulation,EUV,ILT,Inverse Lithography,Computational Lithography,OPC,Resist 3D,Resist Profile,Resist Top Loss,Hotspot Repair,Rigorous Simulation

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