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EUV Local CDU Healing Performance and Modeling Capability Towards 5nm Node

Tae Kwon Jee,Vadim Timoshkov,Peter Choi,David Rio, Yu-Cheng Tsai,Hidetami Yaegashi,Kyohei Koike,Carlos Fonseca,Stijn Schoofs

INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017（2017）

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关键词
5nm node,contact hole,CD healing,local CDU,after-etch model,OPC errors,EPE
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