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    • Construction And Optimization Of The Reactor For Rapid Thermal Processing Of Large Diameter Wafers

    Oa Agueev,Am Svetlichny,An Kocherov

    PAN PACIFIC MICROELECTRONICS SYMPOSIUM, 2001, PROCEEDINGS（2001）

    Taganrog State Univ Radio Engn

    Cited 0|Views0
    Abstract
    The rapid thermal processing (RTP) by a non-coherent radiation is one of the most perspective heat methods under production of ULSIC. The magnification of wafers diameter used in microelectronic technology has led to amplification of interest to a reactor construction optimization problem for RTP apparatus.In the present work with the help of mathematical modeling methods the general regularities of reactor geometry influence for RTP on silicon wafers exposure with 200 mm diameter are considered The recommendations for increase the distribution of light stream uniformity on a surface of the wafer are represented The optimization of reactionary camera construction is achieved.
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    Key words
    rapid thermal processing, big diameter wafers, modeling, reactor construction optimization
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