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TEUS: High-Brightness EUV LPP Light Source Based on Fast Rotating Target: Product Overview and Specifications

Mikhail Krivokorytov,Konstantin Koshelev,Alexander Vinokhodov,Oleg Yakushev,Vladimir Ivanov,Vladimir Krivtsun, Alexander Lash,Vyacheslav Medvedev,Vladimir Gubarev,Denis Glushkov, Samir Ellwi, Eugene Gorsky, Alexey Kiselev

International Conference on Extreme Ultraviolet Lithography 2021（2021）

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