Investigation of the Effect and Contribution of Process Parameters by Taguchi and ANOVA Analysis on the Morphological and Electrical Properties of RF Magnetron Sputtered SiO2 over Si Substrate
PROCEEDINGS OF ASME 2021 INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION (IMECE2021), VOL 3（2021）
Key words
Sputtering system,SiO2 thin film,Taguchi analysis,impedance spectroscopy
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined