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Probabilistic Process Window: A New Approach to Focus-Exposure Analysis

Chris A. Mack,Jonathan Yannuzzi,Gian Lorusso,Mohamed Zidan,Danilo De Simone,Ataklti Weldeslassie,Nadia Vandenbroeck,Philippe Foubert,Christophe Beral,Anne-Laure Charley

Journal of Micro/Nanopatterning Materials and Metrology（2023）

Cited 2|Views11
Key words
focus-exposure matrix,process window,exposure latitude,depth of focus (DOF),exposure latitude versus DOF
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