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Enhanced Cu CMP Process Control by Machine Learning Enabled Measurement on E-Test Macro

Padraig Timoney, Joseph Luke,Mark Rovereto, Jordan Wyble, Cheng-Ting Lien, Zahir Alamgir,Eswar Ramanathan

2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)(2023)

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关键词
CMP,BEOL,APC,Supervised Machine Learning,Trench Height,E Test,Resistance
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